Diseño y fabricación de un aparato para el depósito de películas delgadas por el método de rotación
DOI:
https://doi.org/10.33064/iycuaa2009455007Keywords:
Deposition, thin films, spin coater, construction, spin coating, semiconductorsAbstract
Spin-coating technique is a widely used coating method to produce thin films of numerous materials. A spin-coater apparatus was designed and built. The system offers digital control, wide speed range (from 1 to 7500 rpm), spin speed stability and compact size. The plate is spun in at least two stages which may be programmed. During the first stage, the plate is spun uniformly from zero to 400 rpm, and rotates at 400 rpm for one minute. During the second stage, the operation conditions (speed and time) can be determined by the operator.
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Copyright (c) 2009 Iliana Ernestina Medina Ramírez
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